Micromachined devices having microbridge structure

A method of fabricating a microbridge structure for a thermal detector array comprises growing a planarising layer on a substrate, growing a ferroelectric material layer on the planarising layer and then etching the planarising layer away, either wholly or partially, to leave a ferroelectric microbr...

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Bibliographische Detailangaben
Hauptverfasser: PARSONS, ANDREW D, NICKLIN, RALPH, SHORROCKS, NICHOLAS M, WALKER, MARTIN J
Format: Patent
Sprache:eng
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Zusammenfassung:A method of fabricating a microbridge structure for a thermal detector array comprises growing a planarising layer on a substrate, growing a ferroelectric material layer on the planarising layer and then etching the planarising layer away, either wholly or partially, to leave a ferroelectric microbridge having a uniform thickness. The planarising layer may be a sacrificial layer or may comprise a sacrificial layer as well as other layers.