Processing system hot plate construction substrate

In a substrate thermal processing device, a temperature of a substrate can be precisely controlled within a short time by means of a hot plate oven. The substrate thermal processing device includes a substrate supporting plate for supporting the substrate, an auxiliary heating/cooling section for he...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HISAI, AKIHIRO, MATSUNAGA, MINOBU, KOBAYASHI, HIROSHI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:In a substrate thermal processing device, a temperature of a substrate can be precisely controlled within a short time by means of a hot plate oven. The substrate thermal processing device includes a substrate supporting plate for supporting the substrate, an auxiliary heating/cooling section for heating or cooling the substrate and having a Peltier effect element and disposed on a lower surface of the substrate supporting plate, and a main heating section for heating the substrate and disposed below the substrate supporting plate and the auxiliary heating/cooling section.