Optical apparatus for rapid defect analysis

Apparatus for inspecting the surface of a sample includes a wide scanning interferometer, which is used to locate defects, or anomalies in the surface, and a narrow scanning interferometer, which is used to develop profiles of individual defects found by the narrow scanning interferometer. The sampl...

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Bibliographische Detailangaben

Hauptverfasser:	DORUNDO, ALAN D, LISANKE, MICHAEL GERARD, TAHERI, ALI REZA, PENA, LANPHUONG THI, LU, HUIZONG, SCHNETZER, ERIC V, MCCORMICK, RICHARD J
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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