Optical apparatus for rapid defect analysis

Apparatus for inspecting the surface of a sample includes a wide scanning interferometer, which is used to locate defects, or anomalies in the surface, and a narrow scanning interferometer, which is used to develop profiles of individual defects found by the narrow scanning interferometer. The sampl...

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Bibliographische Detailangaben
Hauptverfasser:	DORUNDO, ALAN D, LISANKE, MICHAEL GERARD, TAHERI, ALI REZA, PENA, LANPHUONG THI, LU, HUIZONG, SCHNETZER, ERIC V, MCCORMICK, RICHARD J
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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Beschreibung
Zusammenfassung:	Apparatus for inspecting the surface of a sample includes a wide scanning interferometer, which is used to locate defects, or anomalies in the surface, and a narrow scanning interferometer, which is used to develop profiles of individual defects found by the narrow scanning interferometer. The sample may be driven in rotation about an axis, while the interferometers are independently moved radially to the axis.