Process for the production of trifluoroethylene

A process for the production of trifluoroethylene (i.e., CF2=CHF or HFC-1123) is disclosed. The process involves contacting (in the vapor phase) at least one halogenated ethane of the formula CF3CClFX (where X is H, Cl or F) with hydrogen in the presence of a catalyst including at least one componen...

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Bibliographische Detailangaben
Hauptverfasser: RAO, V.N. MALLIKARJUNA, MANOGUE, WILLIAM H
Format: Patent
Sprache:eng
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Zusammenfassung:A process for the production of trifluoroethylene (i.e., CF2=CHF or HFC-1123) is disclosed. The process involves contacting (in the vapor phase) at least one halogenated ethane of the formula CF3CClFX (where X is H, Cl or F) with hydrogen in the presence of a catalyst including at least one component selected from elemental metals, metal oxides, metal halides and metal oxyhalides. The metal of the component is ruthenium, copper, nickel, and/or chromium and the halogen of the halides and the oxyhalides is fluorine and/or chlorine.