Semiconductor wafer and method of manufacturing same

In a semiconductor wafer according to this invention, an epitaxial layer is formed on the surface of a semiconductor substrate, a second element which is not the same but homologous as a first element constituting the semiconductor substrate is present to have a peak concentration on the semiconduct...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KUSAKA, TAKAHISA, OHASHI, MASANORI, TAKIZAWA, RITSUO, KANBE, HIDEO, HIGUCHI, TAKAYOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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