Illumination system and exposure apparatus having the same

An illumination system includes a spectral optical element for separating radiation light from a radiation source, including at least one of X-rays and vacuum ultraviolet rays. The spectral optical element provides an emission angle to the radiation light which changes with the wavelength thereof. T...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	MIYAKE, AKIRA, HAYASHIDA, MASAMI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	An illumination system includes a spectral optical element for separating radiation light from a radiation source, including at least one of X-rays and vacuum ultraviolet rays. The spectral optical element provides an emission angle to the radiation light which changes with the wavelength thereof. The system also includes an optical arrangement for illuminating an object with radiation light of a particular wavelength from the spectral optical element, and an absorption element for absorbing at least a portion of radiation light of a wavelength longer than the particular wavelength from the spectral optical element.