Method of polishing

A method for CMP of, illustratively, tungsten is disclosed. Hydroxylamine or hydroxylamine sulfate are employed to oxidize the metal, while gamma ( gamma ) alumina is employed to abrade the oxidized metal.

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Bibliographische Detailangaben
Hauptverfasser:	OBENG, YAW SAMUEL
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES
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Beschreibung
Zusammenfassung:	A method for CMP of, illustratively, tungsten is disclosed. Hydroxylamine or hydroxylamine sulfate are employed to oxidize the metal, while gamma ( gamma ) alumina is employed to abrade the oxidized metal.