Process for producing layers of cubic boron nitride

PCT No. PCT/DE95/00315 Sec. 371 Date Sep. 4, 1996 Sec. 102(e) Date Sep. 4, 1996 PCT Filed Mar. 3, 1995 PCT Pub. No. WO95/23879 PCT Pub. Date Sep. 8, 1995Process for producing wear-resistant layers of cubic boron nitride or wear-resistant layers containing cubic boron nitride by sputtering with RF or...

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Hauptverfasser:	BEWILOGUA, KLAUS, LUETHJE, HOLGER, DAAUD, SIMONE
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Zusammenfassung:	PCT No. PCT/DE95/00315 Sec. 371 Date Sep. 4, 1996 Sec. 102(e) Date Sep. 4, 1996 PCT Filed Mar. 3, 1995 PCT Pub. No. WO95/23879 PCT Pub. Date Sep. 8, 1995Process for producing wear-resistant layers of cubic boron nitride or wear-resistant layers containing cubic boron nitride by sputtering with RF or DC voltage in the operating mode of an unbalanced magnetron, in which the plasma is generated by DC arc discharges or DC operated magnetron cathodes. The initial target for the production of the layer from which the material is removed comprises electrically conductive material containing boron, preferably boron carbide, and, in the process, the reactive process is conducted with the addition of N2 and Ar in such a way that the necessary stoichiometric ratio BiN in the layer can be adjusted.