Method of accurate compositional analysis of dielectric films on semiconductors

A method of accurately determining the composition of a dielectric film in a semiconductor device by performing a compositional analysis on a film only portion of the semiconductor device.

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Bibliographische Detailangaben
Hauptverfasser: ALVIS, ROGER L, ROMERO, JEREMIAS D, FATEMI, HOMI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of accurately determining the composition of a dielectric film in a semiconductor device by performing a compositional analysis on a film only portion of the semiconductor device.