Method of accurate compositional analysis of dielectric films on semiconductors
A method of accurately determining the composition of a dielectric film in a semiconductor device by performing a compositional analysis on a film only portion of the semiconductor device.
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A method of accurately determining the composition of a dielectric film in a semiconductor device by performing a compositional analysis on a film only portion of the semiconductor device. |
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