Method and system for analyzing plasma data

Analysis of plasma data indicative of gaseous species therein, such as Optical Emission Spectroscopy (OES) data, is aided through the interactive use of a computer. OES data may be calibrated by the computer with minimal input from the user regarding a gas the user knows or suspects is present. The...

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Bibliographische Detailangaben
Hauptverfasser:	OSBORN, BROCK E, GIFFORD, GEORGE G
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	Analysis of plasma data indicative of gaseous species therein, such as Optical Emission Spectroscopy (OES) data, is aided through the interactive use of a computer. OES data may be calibrated by the computer with minimal input from the user regarding a gas the user knows or suspects is present. The computer then assumes the presence of that gas and assigns relative intensity peaks to known wavelengths for that gas, allowing calibration to take place. Selective identification of particular gases from the data is also possible. Used in conjunction with selective identification, a learning function allows the system to improve the accuracy of future gaseous species identification. Certain characteristics of a particular gas over time, such as intensity at a particular wavelength or at all wavelengths, may also be automatically plotted.