Method of non-destructively testing a sputtering target

A method of quality control for targets intended for use in the sputtering process. A test parameter is established by immersing the target in a tank of liquid, irradiating the target with ultrasonic energy in the Rayleigh frequency range, and integrating the portion of the ultrasonic energy which p...

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Bibliographische Detailangaben
Hauptverfasser:	DITTMAR, MARK B, BOUCHARD, FREDERIC
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING
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Beschreibung
Zusammenfassung:	A method of quality control for targets intended for use in the sputtering process. A test parameter is established by immersing the target in a tank of liquid, irradiating the target with ultrasonic energy in the Rayleigh frequency range, and integrating the portion of the ultrasonic energy which passes through the target and reflects off the back wall. This test parameter is closely related to the uniformity of a film which may be sputtered from the target onto a substrate.