Method for the photolithographic production of structures on a support

The present invention relates to a method for the photolithographic production of structures on a support, in particular, the production of structures of the ink feed channels for ink jet heads of ink jet printers, in which the support is provided with a dry-film resist. The object of the invention...

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Bibliographische Detailangaben
Hauptverfasser:	WIELAND, RAINER, HOUBEN, WILFRIED
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CORRECTION OF TYPOGRAPHICAL ERRORS ELECTROGRAPHY HOLOGRAPHY i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME LINING MACHINES MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING SELECTIVE PRINTING MECHANISMS STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	The present invention relates to a method for the photolithographic production of structures on a support, in particular, the production of structures of the ink feed channels for ink jet heads of ink jet printers, in which the support is provided with a dry-film resist. The object of the invention is to obtain a high steepness of the flank of the structures. This object is achieved in the manner that the support, together with the dry-film resist, is subjected to a brief exposure corresponding to the intended structuring, followed by a rapid heating of the support.