Monomolecular resist and process for beamwriter

A process for the manufacture of submicron circuits uses a submicron beam writer having multiple beams to Inscribe simultaneously a plurality of metal patterns onto a glass surface having a monoatomic or monomolecular resist. The beams produce a plurality of charged double layers constituting the pattern. Metal is deposited according to the pattern. The pattern may have metal strips with 20 to 100 A gaps coated with different materials having different work functions on opposing gap-faces, forming tunnel junctions acting as diodes. The patterns may be costed with Insulating coatings. The manufacturing equipment, chemistry and processes for manufacturing these sheet products are described. The sheet products may be employed as a light-electric power converter (LEPCON TM ); or, in reverse with electric power supplied, as a large area laser, (ELCON TM ) used for 2D or 3D displays, for a high density high speed computer matrix and for a variety of uses.