Infrared absorbing film improved in transparency

Disclosed is an infrared absorbing film comprising a synthetic resin and silicon oxide, wherein the silicon oxide is used in an amount of about 2 to about 25% by weight based on the synthetic resin, and wherein the silicon oxide is produced by underwater grinding, has an average particle size of not...

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Hauptverfasser: NEGAWA, HIDEO, KOTANI, KOZO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Disclosed is an infrared absorbing film comprising a synthetic resin and silicon oxide, wherein the silicon oxide is used in an amount of about 2 to about 25% by weight based on the synthetic resin, and wherein the silicon oxide is produced by underwater grinding, has an average particle size of not more than 4 mu m, is substantially free of particles exceeding 20 mu m in average particle size, and has a specific surface area of not more than 20 m /g. The film may further comprise a transparent resin layer formed over at least one surface thereof.