Mechanical lift-off process of a metal layer on a polymer

A lift-off process for removing a portion of a metal layer (4). The metal layer is formed on a dielectric polymer substrate with interposition of a corresponding portion of an intermediate layer (2). This process comprises the steps of selecting the material of the intermediate layer so that its int...

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Bibliographische Detailangaben
Hauptverfasser: TORRES, JOAQUIM, SCHILTZ, ANDRE, PALLEAU, JEAN
Format: Patent
Sprache:eng
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Zusammenfassung:A lift-off process for removing a portion of a metal layer (4). The metal layer is formed on a dielectric polymer substrate with interposition of a corresponding portion of an intermediate layer (2). This process comprises the steps of selecting the material of the intermediate layer so that its interface with the metal has a low adhesivity; applying to the structure a mechanical stress causing detachment of the metal at the interface; and chemically removing the intermediate layer.