Apparatus and method for uniformly coating a substrate in an evacuable chamber

An apparatus and method including a droplet coating generator for generating a stream of electrically charged coating droplets within an evacuable chamber towards a substrate positioned within the evacuable chamber. A piezoelectric vibrator and orifice plate coupled thereto generate the stream of co...

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Bibliographische Detailangaben
Hauptverfasser:	ENSOR, DAVID S, DONOVAN, ROBERT P, CLAYTON, ANTHONY C, PERIASAMY, RAVINDRAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MATERIALS THEREFOR NOZZLES ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS TRANSPORTING
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Beschreibung
Zusammenfassung:	An apparatus and method including a droplet coating generator for generating a stream of electrically charged coating droplets within an evacuable chamber towards a substrate positioned within the evacuable chamber. A piezoelectric vibrator and orifice plate coupled thereto generate the stream of coating droplets. The coating droplets are urged to move in a sweeping motion across the substrate by at least one pair of opposing spaced apart electrodes powered by an electrical power supply. A uniform coating is thus produced while the evacuable chamber is maintained at subatmospheric pressure as required during typical semiconductor processing. Multiple applications of a photoresist coating may be applied by the coating apparatus without requiring that the evacuable chamber be repeatedly vented and pumped down to subatmospheric pressure.