Semiconductor device having a built-in capacitor and manufacturing method thereof

A semiconductor device having a built-in capacitor comprises a substrate, an internal electrode provided on a top side of the substrate, a dielectric film provided so as to cover the internal electrode for establishing a predetermined capacitance, a surface electrode provided on the dielectric film so as to make a contact therewith, a plurality of through holes formed in the substrate in correspondence to the internal electrode so as to extend from a bottom side to the top side, and a back-side electrode provided on the bottom side of the substrate including the through holes so as to make a contact with the internal electrode through the through holes.