Preparation of urethane prepolymers having low levels of residual toluene diisocyanate
A wiped film evaporation process for reducing the amount of residual organic polyisocyanate, especially toluene diisocyanate, in a polyurethane prepolymer reaction product mixture. An inert sweeping gas is added to the evaporation process, preferably after first passing through a holdup volume of th...
Gespeichert in:
| Hauptverfasser: | , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | STARNER WILLIAM E TOSELAND BERNARD A MACHADO REINALDO M |
| description | A wiped film evaporation process for reducing the amount of residual organic polyisocyanate, especially toluene diisocyanate, in a polyurethane prepolymer reaction product mixture. An inert sweeping gas is added to the evaporation process, preferably after first passing through a holdup volume of the prepolymer which has passed through the evaporation zone. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US5202001A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US5202001A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US5202001A3</originalsourceid><addsrcrecordid>eNqFjE0KwjAQRrNxIeoZnAsIseIBpCguBX-2ZWinNjBmQiap9PZGcO_qg8d739w8LpECRkxOPEgPOVIa0BOEwoWnF0WFAUfnn8DyBqaRWL9mJHVdRoYknKkUnXMq7YQeEy3NrEdWWv12Ydan460-b8ppQxqwLUVq7td9ZStrt4fdf-MDskA5tA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Preparation of urethane prepolymers having low levels of residual toluene diisocyanate</title><source>esp@cenet</source><creator>STARNER; WILLIAM E ; TOSELAND; BERNARD A ; MACHADO; REINALDO M</creator><creatorcontrib>STARNER; WILLIAM E ; TOSELAND; BERNARD A ; MACHADO; REINALDO M</creatorcontrib><description>A wiped film evaporation process for reducing the amount of residual organic polyisocyanate, especially toluene diisocyanate, in a polyurethane prepolymer reaction product mixture. An inert sweeping gas is added to the evaporation process, preferably after first passing through a holdup volume of the prepolymer which has passed through the evaporation zone.</description><language>eng</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; METALLURGY ; ORGANIC CHEMISTRY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>1993</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930413&DB=EPODOC&CC=US&NR=5202001A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,782,887,25571,76555</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930413&DB=EPODOC&CC=US&NR=5202001A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>STARNER; WILLIAM E</creatorcontrib><creatorcontrib>TOSELAND; BERNARD A</creatorcontrib><creatorcontrib>MACHADO; REINALDO M</creatorcontrib><title>Preparation of urethane prepolymers having low levels of residual toluene diisocyanate</title><description>A wiped film evaporation process for reducing the amount of residual organic polyisocyanate, especially toluene diisocyanate, in a polyurethane prepolymer reaction product mixture. An inert sweeping gas is added to the evaporation process, preferably after first passing through a holdup volume of the prepolymer which has passed through the evaporation zone.</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1993</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqFjE0KwjAQRrNxIeoZnAsIseIBpCguBX-2ZWinNjBmQiap9PZGcO_qg8d739w8LpECRkxOPEgPOVIa0BOEwoWnF0WFAUfnn8DyBqaRWL9mJHVdRoYknKkUnXMq7YQeEy3NrEdWWv12Ydan460-b8ppQxqwLUVq7td9ZStrt4fdf-MDskA5tA</recordid><startdate>19930413</startdate><enddate>19930413</enddate><creator>STARNER; WILLIAM E</creator><creator>TOSELAND; BERNARD A</creator><creator>MACHADO; REINALDO M</creator><scope>EVB</scope></search><sort><creationdate>19930413</creationdate><title>Preparation of urethane prepolymers having low levels of residual toluene diisocyanate</title><author>STARNER; WILLIAM E ; TOSELAND; BERNARD A ; MACHADO; REINALDO M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US5202001A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1993</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>STARNER; WILLIAM E</creatorcontrib><creatorcontrib>TOSELAND; BERNARD A</creatorcontrib><creatorcontrib>MACHADO; REINALDO M</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>STARNER; WILLIAM E</au><au>TOSELAND; BERNARD A</au><au>MACHADO; REINALDO M</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Preparation of urethane prepolymers having low levels of residual toluene diisocyanate</title><date>1993-04-13</date><risdate>1993</risdate><abstract>A wiped film evaporation process for reducing the amount of residual organic polyisocyanate, especially toluene diisocyanate, in a polyurethane prepolymer reaction product mixture. An inert sweeping gas is added to the evaporation process, preferably after first passing through a holdup volume of the prepolymer which has passed through the evaporation zone.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US5202001A |
| source | esp@cenet |
| subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS CHEMISTRY COMPOSITIONS BASED THEREON MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | Preparation of urethane prepolymers having low levels of residual toluene diisocyanate |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-06T20%3A35%3A55IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=STARNER;%20WILLIAM%20E&rft.date=1993-04-13&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS5202001A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |