Preparation of urethane prepolymers having low levels of residual toluene diisocyanate

A wiped film evaporation process for reducing the amount of residual organic polyisocyanate, especially toluene diisocyanate, in a polyurethane prepolymer reaction product mixture. An inert sweeping gas is added to the evaporation process, preferably after first passing through a holdup volume of th...

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Bibliographische Detailangaben
Hauptverfasser: STARNER, WILLIAM E, TOSELAND, BERNARD A, MACHADO, REINALDO M
Format: Patent
Sprache:eng
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Zusammenfassung:A wiped film evaporation process for reducing the amount of residual organic polyisocyanate, especially toluene diisocyanate, in a polyurethane prepolymer reaction product mixture. An inert sweeping gas is added to the evaporation process, preferably after first passing through a holdup volume of the prepolymer which has passed through the evaporation zone.