Preparation of urethane prepolymers having low levels of residual toluene diisocyanate
A wiped film evaporation process for reducing the amount of residual organic polyisocyanate, especially toluene diisocyanate, in a polyurethane prepolymer reaction product mixture. An inert sweeping gas is added to the evaporation process, preferably after first passing through a holdup volume of th...
Gespeichert in:
Hauptverfasser: | , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A wiped film evaporation process for reducing the amount of residual organic polyisocyanate, especially toluene diisocyanate, in a polyurethane prepolymer reaction product mixture. An inert sweeping gas is added to the evaporation process, preferably after first passing through a holdup volume of the prepolymer which has passed through the evaporation zone. |
---|