Electron beam measuring apparatus

An electron beam measuring apparatus for measuring size of pattern on surface of a specimen comprising, an electron gun, an electron lens for focusing the electron beam from the electron gun on the specimen surface, a deflector for deflecting the electron beam, a spot control means for forming a fla...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MINAMIKAWA, YOSHIHISA, KATO, SHINICHI, NAKAMURA, KAZUMITSU, SAKITANI, YOSHIO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An electron beam measuring apparatus for measuring size of pattern on surface of a specimen comprising, an electron gun, an electron lens for focusing the electron beam from the electron gun on the specimen surface, a deflector for deflecting the electron beam, a spot control means for forming a flat edge portion in the electron beam spot, a rotation coil for rotating the electron beam so that the flat portion of the electron beam spot becomes to be perpendicular to the scanning direction of the electron beam, a detecting means for detecting secondary electrons reflected from the specimen surface, and a computer for calculating the size of the pattern based on the secondary electrons from the detecting means. As the flat portion of the electron beam spot is perpendicular to the scanning direction, the size of pattern is measured with high accuracy.