RADIATION SENSITIVE COMPOSITION UTILIZING ETHYLENICALLY UNSATURATED PERFLUOROALKYL GROUP-CONTAINING COMPOUNDS AND REPRODUCTION LAYERS PRODUCED THEREFROM

Polymerizable compounds comprising perfluoroalkyl groups, reproduction layers containing these compounds, and use of the reproduction layers for waterless offset printing. The novel polymerizable compounds comprise at least two acryloyl or methacryloyl groups and at least one perfluoroalkyl group which is linked to the molecule through a functional group, in particular, an ester or amide function. The compounds can be prepared, for example, from hydroxyl group-containing acrylates or methacrylates and perfluoroalkyl group-containing carboxylic acid chlorides, in the presence of an amine or from perfluoroalkyl group-containing carboxylic acid derivatives and reactive acryloyloxy or methacryloyloxy compounds. Oligomeric compounds can additionally be synthesized from the above-mentioned compounds by linking, for example, with diisocyanates. The compounds are particularly used in radiation-sensitive reproduction layers which also contain at least one photoinitiator and, optionally, at least one organic polymeric binder. Reproduction layers of this kind are applied as radiation-sensitive coatings to support materials for printing plates used in waterless offset printing.