Rotational flexure stage

The flexure stage disclosed herein is useful in aligning a semiconductor wafer during microlithographic exposure to define circuit elements on the surface of the wafer. The stage is a unitary structure which permits essentially lossless small angle relative rotation of a central portion of the stage...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: BARSKY, SAMUEL M
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The flexure stage disclosed herein is useful in aligning a semiconductor wafer during microlithographic exposure to define circuit elements on the surface of the wafer. The stage is a unitary structure which permits essentially lossless small angle relative rotation of a central portion of the stage with respect to an outer, annular portion of the stage. Three pairs of slots define three links extending radially with respect to the axis of rotation and, radially outwardly from each pair of slots, a respective transverse slot in the outer portion provides radial compliance for the outer end of the respective link.