Novel chemical compounds and their use as low foam surfactants and antifoaming agents

Novel chemical compounds which have formula CH3 CH2 CH2 )(A)R in which (A) is a polyalkylene oxide chain comprising 5 to 18 alkylene oxide residues in which there are 0 to 10 propylene oxide residues for every 10 ethylene oxide residues and R is a C8 to C18 alkyl group are suitable for use as low fo...

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Hauptverfasser: BLEASE, TREVOR G
Format: Patent
Sprache:eng
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Zusammenfassung:Novel chemical compounds which have formula CH3 CH2 CH2 )(A)R in which (A) is a polyalkylene oxide chain comprising 5 to 18 alkylene oxide residues in which there are 0 to 10 propylene oxide residues for every 10 ethylene oxide residues and R is a C8 to C18 alkyl group are suitable for use as low foam surfactants or antifoaming agents in cleaning processes and rinsing applications.