Process for depositing a silicon carbide coating on a filament

A process for depositing a silicon carbide coating on a filament (1), which comprises heating the filament (1) in a deposition chamber (3) containing a gaseous atmosphere which on contact with the hot filament (1) deposits a coating of silicon carbide; characterised in that the atmosphere in the dep...

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Bibliographische Detailangaben
Hauptverfasser:	GRUBER, PHILIP
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBONFILAMENTS CHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS,THREADS, FIBRES, BRISTLES OR RIBBONS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAUNDERING METALLURGY NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TEXTILES TREATMENT OF TEXTILES OR THE LIKE TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS,FABRICS, FEATHERS, OR FIBROUS GOODS MADE FROM SUCH MATERIALS
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Beschreibung
Zusammenfassung:	A process for depositing a silicon carbide coating on a filament (1), which comprises heating the filament (1) in a deposition chamber (3) containing a gaseous atmosphere which on contact with the hot filament (1) deposits a coating of silicon carbide; characterised in that the atmosphere in the deposition chamber (3) includes a minor amount of carbon dioxide.