Method for improving atomic oxygen resistance

Filled fluorosilicone and filled fluorophosphazene composite films and unfilled fluorosilicone, fluorophosphazene, or copolymers provide atomic oxygen resistance to protect surfaces on spacecraft in low earth orbit. The preferred composite films are generally made by polymerizing suitable precursors...

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Bibliographische Detailangaben
Hauptverfasser:	TORRE, LARRY P, ZORNES, JR., BRUCE L
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY COMPOSITIONS BASED THEREON METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:	Filled fluorosilicone and filled fluorophosphazene composite films and unfilled fluorosilicone, fluorophosphazene, or copolymers provide atomic oxygen resistance to protect surfaces on spacecraft in low earth orbit. The preferred composite films are generally made by polymerizing suitable precursors on the exposed surfaces, the filler being mixed with the polymer precursors prior to curing. Second surface mirrors can be protected with these films while the flexibility of the mirror is retained.