Poly(aryl ether sulfone)-poly(aryl ether ketone) block copolymers block copolymers

Novel poly(aryl ether sulfone)-poly(aryl ether ketone) block copolymers are described. They are prepared by the nucleophilic polycondensation of a hydroxy- or halo-terminated poly(aryl ether ketone) oligomer with the poly(aryl ether sulfone) forming reagents; alternatively, a preformed poly(aryl eth...

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Hauptverfasser: MATZNER, MARKUS, BOTKIN, JAMES H, WINSLOW, PAUL A
Format: Patent
Sprache:eng
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Zusammenfassung:Novel poly(aryl ether sulfone)-poly(aryl ether ketone) block copolymers are described. They are prepared by the nucleophilic polycondensation of a hydroxy- or halo-terminated poly(aryl ether ketone) oligomer with the poly(aryl ether sulfone) forming reagents; alternatively, a preformed poly(aryl ether sulfone) block may be used. The novel copolymers are tough materials with excellent heat, solvent, and stress-crack resistanced. They display high HDT's (heat distortion temperatures) and are useful in molding, extrusion and composites applications.