Circuit arrangement for the combined application of an inductive and capacitative device for the non-destructive measurement of the ohmic resistance of thin layers

The invention concerns a circuit arrangement for the combined application of an inductive and capacitative device (2, 3) for the non-destructive measurement of the ohmic resistance of thin layers. Such thin layers are, for instance, produced in high vacuum technology by evaporation. The inductive and capacitative devices (2, 3) are disposed in the immediate vicinity of the layer to be measured and are fed with a high-frequency voltage UHF. Since the inductive device (2, 3) has an oscillating circuit (4, 5) which is always continuously tuned to resonance, one is concerned with currents which flow both into the capacitative and the inductive devices (2, 3) and which are proportional to the conductivity of the layer to be measured. By evaluating these currents for which, according to the invention, the same circuity may be used, it becomes possible to make inferences about the surface resistance of the thin layer.