Wide area soft vacuum abnormal glow electron beam discharge hardening process

A process for large area hardening of photoresists or polymer films placed on substrates is disclosed. The process requires the use of a short duration (

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Bibliographische Detailangaben
Hauptverfasser:	KRISHNASWAMY, JAYARAM, COLLINS, GEORGE J
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A process for large area hardening of photoresists or polymer films placed on substrates is disclosed. The process requires the use of a short duration (