Ion generator and ion application system
A vacuum chamber (12) within which an instrument (22) to be calibrated or tested is placed, is fitted with an ion gun (14) having an ion source (48). The source (48) has an electron emitting filament (60) positioned adjacent one end of an ionization chamber (71), with a negatively biased grid (72) l...
Gespeichert in:
Hauptverfasser: | , , , , , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A vacuum chamber (12) within which an instrument (22) to be calibrated or tested is placed, is fitted with an ion gun (14) having an ion source (48). The source (48) has an electron emitting filament (60) positioned adjacent one end of an ionization chamber (71), with a negatively biased grid (72) located behind the filament (60). Gas is injected into the source (48) by a gas flow regulator (54) in one end (52) of the source (48). The chamber (71) is surrounded by a plurality of independently energizable coils (82, 84, 86, 88, 90), with the last coil (90) being operated at the highest current level, thus producing the highest magnetic flux. This presents a region (160) of magnetic repulsion to the electrons produced by the filament (60) and causes them to be confined between the grid (72) and the region (160), greatly increasing the chances that an ionization collision will occur between the electrons and atoms of injected gas. Ions are extracted from the ionization chamber (71) by a negatively biased extractor grid (106) positioned adjacent an opposite end (80) of the chamber (71) and are collimated by a negatively biased shield grid (110) positioned adjacent the extractor grid (106). |
---|