Method for processing silver halide photographic light-sensitive materials

A method for processing silver halide photographic materials is disclosed. In this method a silver halide photographic material is developed in the presence of at least one compound represented by the following Formula [Ia] or [Ib]: Formula [Ia] Formula [Ia] wherein Ar is a benzene or naphthalene ring, F is a fluorine atom, Y and Y' are substituents, X is a bivalent atom or a bivalent linkage group. The compound may be contained in a processing solution or in the silver halide photographic light-sensitive material to be processed. A fog of the silver halide photographic material, especially a fog due to a storage of the materials at a high temperature can be considerably decreased.