Method and apparatus for improving the yield of integrated circuit devices

Method and apparatus for improving the yield of integrated circuit devices

A method and apparatus for reducing the incidence of product contamination during processing of the product in a vacuum chamber. By providing soft-start valves in the vacuum and vent lines, and by properly driving said soft-start valves, it is possible to reduce the gas flow rates from and into the...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: STOLTENBERG, KEVIN J
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CONTROLLING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PHYSICS
REGULATING
SEMICONDUCTOR DEVICES
SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A method and apparatus for reducing the incidence of product contamination during processing of the product in a vacuum chamber. By providing soft-start valves in the vacuum and vent lines, and by properly driving said soft-start valves, it is possible to reduce the gas flow rates from and into the vacuum chamber to such a low level, that dust-like particles remaining in the chamber from prior product processing steps is not disturbed and allowed to settle upon the product then being treated.