Photomask material

A photomask material comprising a transparent glass substrate and a metal silicide film formed on the transparent glass substrate, the rate of a silicon and a metal in the metal silicide film being continuously varied so as to increase the amount of metal toward an upper surface of the metal silicid...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	WATAKABE, YAICHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A photomask material comprising a transparent glass substrate and a metal silicide film formed on the transparent glass substrate, the rate of a silicon and a metal in the metal silicide film being continuously varied so as to increase the amount of metal toward an upper surface of the metal silicide film.