Method of apparatus for depositing oxide-cathode precursor material on a cathode substrate by air spraying

Method and apparatus for depositing a layer of oxide-cathode precursor material on a cathode substrate includes passing a slurry of precursor material from a pool of slurry in a closed pressurized vessel through a tubular means to an air spray gun, wherein the tubular means presents a predetermined...

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Hauptverfasser: RANGACHAR, HEMMIGE V
Format: Patent
Sprache:eng
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Zusammenfassung:Method and apparatus for depositing a layer of oxide-cathode precursor material on a cathode substrate includes passing a slurry of precursor material from a pool of slurry in a closed pressurized vessel through a tubular means to an air spray gun, wherein the tubular means presents a predetermined resistance to the flow of slurry. Compressed gas flowing through the gun produces a fluctuating siphon pressure in the tubular means and produces a spray of slurry which is scanned across the substrate. The flow resistance in the tubular means dampens the fluctuating component of the siphon pressure while the pressure in the vessel overcomes the flow resistance, controls the slurry flow rate, and makes the flow rate less susceptible to variation due to other factors.