X-ray source comprising double-angle conical target
An improved X-ray source for a lithographic system comprises a double-angle conical target. The target is characterized by a small apparent source diameter and an efficient cooling system. Submicron resolution and high-power operation are thereby made feasible.
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | An improved X-ray source for a lithographic system comprises a double-angle conical target. The target is characterized by a small apparent source diameter and an efficient cooling system. Submicron resolution and high-power operation are thereby made feasible. |
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