Wafer handling apparatus and method

Compact apparatus characterized by cleanliness of operation, high throughput and low cost is designed for automatically loading and unloading wafer-carrying trays that are designed to be mounted in the reaction chamber of a processing system. A key component of the apparatus comprises a unique wafer...

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Bibliographische Detailangaben
Hauptverfasser:	DEAN, ROBERT E, DEIN, EDWARD A
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CONVEYING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HANDLING THIN OR FILAMENTARY MATERIAL PACKING PERFORMING OPERATIONS PNEUMATIC TUBE CONVEYORS SEMICONDUCTOR DEVICES SHOP CONVEYOR SYSTEMS STORING TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING TRANSPORTING
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Beschreibung
Zusammenfassung:	Compact apparatus characterized by cleanliness of operation, high throughput and low cost is designed for automatically loading and unloading wafer-carrying trays that are designed to be mounted in the reaction chamber of a processing system. A key component of the apparatus comprises a unique wafer vacuum chuck.