Electrode support device for continuous electroplating bath

An electrode support device for a continuous electroplating bath includes current supply rotating drums whose parts are immersed in the electroplating bath, a metal strip to be plated being trained about the immersed parts of the rotating drums, and a number of arcuate consumable electrodes arranged side by side along generators of the rotating drums and successively movable on support surfaces of electrode supports so as to supply new consumable electrodes at one ends of the arranged electrodes and remove consumed electrodes from the other ends. According to the invention, the support device comprises adjusting means for adjusting the electrode supports to remove any unevenness of gaps between the metal strip and the consumable electrodes, thereby preventing failures due to unevenness of the gaps resulting from unavoidable irregular wear on support surfaces of the electrode supports and externally adjusting the gaps to meet electrolytic conditions to eliminate edge-overcoating which would occur when the width of the strip changes to be wider.