Method of aligning electron beam apparatus

Electron beam apparatus is used to develop a resist coated work piece such as a semiconductor wafer which is mounted on a moveable XY table within the apparatus work chamber. A work piece holder includes an alignment device for aligning the electron beam for highly accurate beam scanning. Thereafter, the electron beam axes are correlated to the work piece axes. In correlating the axes, the electron beam is rotated whereby the beam X and Y axes are parallel to the work piece X and Y axes, respectively. The work piece axes are then correlated to the axes of the XY table by locating the table coordinates of two known positions on the wafer.