Photoresist materials and processes of using with photosensitive naphthoquinone diazides and nitrones

A photosensitive recording material which includes in a supported layer a mixture of photosensitive substances in admixture with one or more polymers that are soluble in an alkaline aqueous liquid, characterized in that such mixture of photosensitive substances essentially consists of: (A) at least one photosensitive nitrone of the formula: in which: R is an aromatic hydrocarbon group including a substituted aromatic hydrocarbon group, R1 is an aromatic or heterocyclic group including these groups in substituted form, n represents zero or 1, and (B) at least one photosensitive naphthoquinone-(1,2)-diazide (2) compound, that has a higher ultraviolet absorption in the wavelength range of 350 to 400 nm and a higher visible light absorption above 400 nm than each such nitrone has, the (A) and (B) compounds being present in such relative quantities to each other that the layer exhibits a relative decrease in solubility in an alkaline aqueous liquid upon a sufficient exposure to a UV-light and a relative increase in solubilty in such alkaline aqueous liquid upon a lesser exposure to visible light or to UV-light.