System and method for controlling an etch line

An etch line for etching apertures in a sheet of material is controlled by measuring the energy transmission capabilities of the apertures immediately after initially rinsing the sheet. A second energy transmission capability measurement is made after the sheet is fully dried. The results of the two...

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Bibliographische Detailangaben
Hauptverfasser:	RANGACHAR, HEMMIGE V, POWELL, KENNETH D
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE
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Beschreibung
Zusammenfassung:	An etch line for etching apertures in a sheet of material is controlled by measuring the energy transmission capabilities of the apertures immediately after initially rinsing the sheet. A second energy transmission capability measurement is made after the sheet is fully dried. The results of the two measurements are combined to produce a predicted transmission signal which is used to control a parameter of the etching process.