Mask set mismatch

A method for marking a mask set to insure minimum mismatch between the masks when they are assembled into a set. Each mask in the set is evaluated against a known fixed standard, identified and marked such that when the set is assembled and utilized to produce an integrated circuit minimum mismatch...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KING, BRUCE D, LEVIN, JAMES P
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REGULATING SEMICONDUCTOR DEVICES SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
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Beschreibung
Zusammenfassung:	A method for marking a mask set to insure minimum mismatch between the masks when they are assembled into a set. Each mask in the set is evaluated against a known fixed standard, identified and marked such that when the set is assembled and utilized to produce an integrated circuit minimum mismatch between each element in each mask in the set will be realized.