Method for metallizing aluminum pads of an integrated circuit chip

A method including a novel bath is described for the nickeling of the aluminum pads of a chip, when either in die form or in wafer assembly. A near-neutral pH immersion zinc bath is used to cover the aluminum with zinc, which is followed by immersion in an electroless boron-nickel solution for nicke...

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Bibliographische Detailangaben
Hauptverfasser:	BURKE, ROBERT L, GUDITZ, ELIS A
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A method including a novel bath is described for the nickeling of the aluminum pads of a chip, when either in die form or in wafer assembly. A near-neutral pH immersion zinc bath is used to cover the aluminum with zinc, which is followed by immersion in an electroless boron-nickel solution for nickeling of the zinc. The method eliminates the need to isolate the chip silicon from the plating bath.