Chemical copper-plating bath

There is presented a chemical copper-plating bath capable of providing a plated film having excellent mechanical characteristics, especially ductility, which bath contains a specific additive having the following formula: Stability of the bath as well as further improvement of mechanical strength of...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HONMA, HIDEO, TAKAMURA, TSUTOMU, SASABE, TOSHIKI, SASAKI, OSAMU, IKARI, KUNIHIRO, TAKEDA, KAZUHIRO
Format: Patent
Sprache:eng
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