Method for producing gallium arsenide single crystal ribbons
The single crystal growth of GaAs is highly anisotropic under certain conditions. A wafer of GaAs is masked and exposed to the vapor only through a long, narrow slot in the direction. A thin ribbon of single crystal GaAs grows out of the slot at a high rate along the vector and has {111} plane major...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The single crystal growth of GaAs is highly anisotropic under certain conditions. A wafer of GaAs is masked and exposed to the vapor only through a long, narrow slot in the direction. A thin ribbon of single crystal GaAs grows out of the slot at a high rate along the vector and has {111} plane major faces and {110} plane edges. This ribbon is flexible. A H2-AsCl3-Ga epitaxy system is modified to permit retraction of the ribbon as it grows and thus the production of long ribbons. |
---|