Method for making electron sensitive negative resist

A polymerized resin capable, upon electronic irradiation, of undergoing a cross-linking completing the polymerization and rendering it insoluble in certain solvents. Such a negative resin is ten times more sensitive to electrons than the best known resin. It is obtained by copolymerization of an epi...

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Bibliographische Detailangaben
Hauptverfasser:	DUCHESNE, CLAUDE, ERANIAN, ARMAND, GAZARD, MARYSE, BARRE, FRANCOISE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	A polymerized resin capable, upon electronic irradiation, of undergoing a cross-linking completing the polymerization and rendering it insoluble in certain solvents. Such a negative resin is ten times more sensitive to electrons than the best known resin. It is obtained by copolymerization of an epithiopropylmethacrylate: and of a vinyl monomer such as methyl methacrylate.