Recovery of HF and HCl from gaseous mixtures thereof

A process is disclosed for recovering HF and HCl in substantially purified form from a gaseous mixture containing HF, HCl and halogenated organic vapors. The process comprises: A. feeding the gaseous mixture to the lower part of a rectification column to provide an upward flow of gases therein, the...

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Bibliographische Detailangaben
Hauptverfasser: MCGREGOR, ALASTAIR J. H, TROLLOPE, GREGORY A. R, ROBOTA, STEPHEN
Format: Patent
Sprache:eng
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Zusammenfassung:A process is disclosed for recovering HF and HCl in substantially purified form from a gaseous mixture containing HF, HCl and halogenated organic vapors. The process comprises: A. feeding the gaseous mixture to the lower part of a rectification column to provide an upward flow of gases therein, the column having a temperature in the upper part of from about -40 DEG C. to about -85 DEG C., and having a temperature in its lower part in the range of from about -30 DEG C. to about 19 DEG C., the column also having a countercurrent flow of a liquid and a gas, B. withdrawing liquid HF from the bottom of the rectification column, C. withdrawing a gas from the top of the rectification column, and feeding the thus withdrawn gas to a condenser, D. condensing at least a portion of the withdrawn gas of step C to a liquid, E. feeding a portion of the condensed liquid of step D to the upper part of the rectification column, and F. recovering HCl gas from the condenser.