Process for fabricating solar cells and the product produced thereby

An electrically conductive, anti-reflective coating is formed on a base layer of prepared silicon in such a manner as to form a good ohmic contact therewith. If doped, the coating can serve as an impurity source during a following diffusion step, in which a PN junction is formed in the silicon. Undoped coatings may be used when the PN junction has previously been formed in the silicon. Thick film electrical contacts are then formed by screen printing on the top surface of the anti-reflective coating and then fired at high temperature, i.e. 500 DEG -1000 DEG C. The material comprising the coating is such that it acts as a barrier to the diffusion of the metal forming the electrical contacts into the silicon base layer during the firing of the thick film contacts. Since the coating is electrically conductive, a conductive path between the contacts and the silicon is established.