Plasma development process controller

End point detection in developing photoresist is accomplished by monitoring the output of a photodetector and sensing a plateau in the output.

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KELLER, JED V
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	End point detection in developing photoresist is accomplished by monitoring the output of a photodetector and sensing a plateau in the output.