Exhaust electrode process for exhaust gas oxygen sensor

A method of sputtering a platinum exhaust gas electrode onto a vitrified zirconia thimble for an electrochemical-type exhaust gas oxygen sensor. Porous high surface area platinum films are deposited that have more consistent properties. A platinum target is spaced about 3.0-4.5 cm from the thimble a...

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Hauptverfasser: GOLD, TERRY J, KENNARD, III, FREDERICK L, KIKUCHI, PAUL C, WILHELM, JR., RALPH V
Format: Patent
Sprache:eng
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Zusammenfassung:A method of sputtering a platinum exhaust gas electrode onto a vitrified zirconia thimble for an electrochemical-type exhaust gas oxygen sensor. Porous high surface area platinum films are deposited that have more consistent properties. A platinum target is spaced about 3.0-4.5 cm from the thimble and more than 6 cm from the sputtering anode. A pressure of about 10-20 millitorr is used during sputtering at a DC power of about 13-22 watts/cm2 of target area.