Vapor deposition apparatus for coating continuously moving substrates with layers of volatizable solid substances

Apparatus for the vapor deposition of volatizable solid substances on continuously moving substrates, more particularly for the production of photographic materials by vapor deposition of silver halides on continuosly moving substrates, is constructed so as to prevent direct contact between heating...

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Bibliographische Detailangaben
Hauptverfasser:	MARTINOV, GEORGI MIRCHEV, BAKARDJIEV, STEFAN TODOROV, MALINOVSKI, YORDAN PETROV
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Apparatus for the vapor deposition of volatizable solid substances on continuously moving substrates, more particularly for the production of photographic materials by vapor deposition of silver halides on continuosly moving substrates, is constructed so as to prevent direct contact between heating means for a crucible for the solid substance and the solid substance therein and to enable a stream of vapor of the solid substance to be produced which is of high intensity enabling a high rate of growth of the deposited layer to occur.